BS ISO 21859:2019 - Fine ceramics (advanced ceramics, advanced technical ceramics). Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

BS ISO 21859:2019

Fine ceramics (advanced ceramics, advanced technical ceramics). Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

Status : Current   Published : June 2019

Format
PDF

Format
HARDCOPY



This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.




Standard NumberBS ISO 21859:2019
TitleFine ceramics (advanced ceramics, advanced technical ceramics). Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
StatusCurrent
Publication Date19 June 2019
Normative References(Required to achieve compliance to this standard)ISO 4287, ISO 18452, ISO 3274
Informative References(Provided for Information)No other standards are informatively referenced
International RelationshipsISO 21859:2019
Draft Superseded By18/30350530 DC
DescriptorsSpecial ceramics, Ceramics, Plasma, Semiconductor manufacture, Test methods, Components
ICS81.060.30
Title in FrenchCéramiques techniques. Méthode d’essai pour déterminer la résistance au plasma des composants céramiques dans les équipements de production à semi-conducteurs
CommitteeRPI/13
ISBN978 0 580 96201 1
PublisherBSI
FormatA4
DeliveryYes
Pages12
File Size490 KB
Price£110.00


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