BS ISO 21466:2019 - Microbeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM

BS ISO 21466:2019

Microbeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM

Status : Current   Published : December 2019

Format
PDF

Format
HARDCOPY



This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.




Standard NumberBS ISO 21466:2019
TitleMicrobeam analysis. Scanning electron microscopy. Method for evaluating critical dimensions by CDSEM
StatusCurrent
Publication Date18 December 2019
Normative References(Required to achieve compliance to this standard)No other standards are normatively referenced
Informative References(Provided for Information)ISO/IEC GUIDE 98-3:2008 Ed 1, ISO 23833:2013, ISO 16700:2016, ISO 22493:2014
International RelationshipsISO 21466:2019
Draft Superseded By18/30344520 DC
DescriptorsScanning electron microscopes, Electron microscopes, Dimensions, Evaluation, Electrons, Analysis
ICS37.020
Title in FrenchAnalyse par microfaisceaux. Méthode d’évaluation des dimensions critiques par CD-SEM
CommitteeCII/9
ISBN978 0 580 94840 4
PublisherBSI
FormatA4
DeliveryYes
Pages56
File Size4.462 MB
Price£254.00


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