ASTM F1709 - 97(2016) - Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

ASTM F1709 - 97(2016)

Standard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications

Status : Current   Published : May 2016

Format
PDF

Format
HARDCOPY



1.1 This specification covers pure titanium sputtering targets used as a raw material in fabricating semiconductor electronic devices.

1.2 This standard sets purity grade levels, physical attributes, analytical methods, and packaging.

1.2.1 The grade designation is a measure of total metallic impurity content. The grade designation does not necessarily indicate suitability for a particular application because factors other than total metallic impurity may influence performance.




Standard NumberASTM F1709 - 97(2016)
TitleStandard Specification for High Purity Titanium Sputtering Targets for Electronic Thin Film Applications
StatusCurrent
Publication Date01 May 2016
Normative References(Required to achieve compliance to this standard)No other standards are normatively referenced
Informative References(Provided for Information)No other standards are informatively referenced
Descriptors Coating, Sputtering, Target, Thin film, Titanium
ICS31.120
PublisherASTM
FormatA4
DeliveryYes
Pages3
File Size67 KB
Price£36.00


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