BS ISO 16531:2013 - Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

BS ISO 16531:2013

Surface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS

Status : Current, Under review   Published : May 2013

Format
PDF

Format
HARDCOPY






Standard NumberBS ISO 16531:2013
TitleSurface chemical analysis. Depth profiling. Methods for ion beam alignment and the associated measurement of current or current density for depth profiling in AES and XPS
StatusCurrent, Under review
Publication Date31 May 2013
Normative References(Required to achieve compliance to this standard)ISO 18115-1
Informative References(Provided for Information)ISO 14606:2000
International RelationshipsISO 16531:2013
Draft Superseded By12/30241146 DC
DescriptorsSurfaces, Surface chemistry, Optical measurement, Chemical composition, Glow discharges, Quantitative analysis, Spectroscopy, Chemical analysis and testing, Thickness, Mass
ICS71.040.40
Title in FrenchAnalyse chimique des surfaces. Profilage d’épaisseur. Méthodes d’alignement du faisceau d’ions et la mesure associée de densité de courant ou de courant pour le profilage d’épaisseur en AES et XPS
CommitteeCII/60
ISBN978 0 580 74315 3
PublisherBSI
FormatA4
DeliveryYes
Pages30
File Size1.743 MB
Price£182.00


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