Standard Number | BS EN 62047-14:2012 |
Title | Semiconductor devices. Micro-electromechanical devices. Forming limit measuring method of metallic film materials |
Status | Current |
Publication Date | 31 May 2012 |
Normative References(Required to achieve compliance to this standard) | EN 62047-1:2006, IEC 62047-1:2005 |
Informative References(Provided for Information) | No other standards are informatively referenced |
International Relationships | EN 62047-14:2012,IEC 62047-14:2012 |
Draft Superseded By | 10/30232073 DC |
Descriptors | Electronic equipment and components, Test specimens, Vibration, Resonance, Thin-film devices, Bend testing, Electromechanical devices, Semiconductor technology, Semiconductor devices, Fatigue testing, Integrated circuits, Test equipment |
ICS | 31.080.99
|
Title in French | Dispositifs à semiconducteurs. Dispositifs microélectromécaniques. Méthode de mesure des limites de formage des matériaux à couche métallique |
Title in German | Halbleiterbauelemente. Bauelemente der Mikrosystemtechnik. Verfahren zur Ermittlung der Grenzformänderung metallischer Dünnschichtwerkstoffe |
Committee | EPL/47 |
ISBN | 978 0 580 72297 4 |
Publisher | BSI |
Format | A4 |
Delivery | Yes |
Pages | 22 |
File Size | 1.333 MB |
Price | £134.00 |