BS ISO 14701:2011 - Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness

BS ISO 14701:2011

Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness

Status : Superseded, Withdrawn   Published : August 2011 Replaced By : BS ISO 14701:2018

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Standard NumberBS ISO 14701:2011
TitleSurface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
StatusSuperseded, Withdrawn
Publication Date31 August 2011
Withdrawn Date05 November 2018
Normative References(Required to achieve compliance to this standard)No other standards are normatively referenced
Informative References(Provided for Information)ISO 18116, ISO/IEC Guide 98-3:2008, ISO/TR 18392
Replaced ByBS ISO 14701:2018
International RelationshipsISO 14701:2011
Draft Superseded By10/30212265 DC
DescriptorsSilicon, Surface chemistry, Surface properties, X-ray photoelectron spectroscopy, Chemical analysis and testing, Thickness measurement, Electron emission, Photoelectron spectroscopy, Oxides, Spectroscopy
ICS71.040.40
Title in FrenchAnalyse chimique des surfaces. Spectroscopie de photoélectrons par rayons X. Mesurage de l'épaisseur d'oxyde de silicium
CommitteeCII/60
ISBN978 0 580 69624 4
PublisherBSI
FormatA4
DeliveryYes
Pages24
File Size589 KB
Price£182.00


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