BS ISO 23812:2009 - Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials

BS ISO 23812:2009

Surface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials

Status : Confirmed, Current   Published : May 2009

Format
PDF

Format
HARDCOPY






Standard NumberBS ISO 23812:2009
TitleSurface chemical analysis. Secondary-ion mass spectrometry. Method for depth calibration for silicon using multiple delta-layer reference materials
StatusConfirmed, Current
Publication Date31 May 2009
Confirm Date21 January 2020
Normative References(Required to achieve compliance to this standard)ISO 18115, ISO 20341
Informative References(Provided for Information)No other standards are informatively referenced
International RelationshipsISO 23812:2009
Draft Superseded By08/30138809 DC
DescriptorsDepth measurement, Mass spectrometry, Calibration, Surface chemistry, Secondary, Chemical analysis and testing, Spectroscopy, Depth, Ions, Silicon, Surfaces
ICS71.040.40
Title in FrenchAnalyse chimique des surfaces. Spectrométrie de masse des ions secondaires. Méthode pour l'étalonnage de la profondeur pour le silicium à l'aide de matériaux de référence à couches delta multiples
CommitteeCII/60
ISBN978 0 580 55765 1
PublisherBSI
FormatA4
DeliveryYes
Pages30
File Size977 KB
Price£182.00


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