BS ISO 14706:2000 - Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

BS ISO 14706:2000

Surface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy

Status : Revised, Superseded, Withdrawn   Published : May 2001 Replaced By : BS ISO 14706:2014

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Standard NumberBS ISO 14706:2000
TitleSurface chemical analysis. Determination of surface elemental contamination on silicon wafers by total-reflection X-ray fluorescence (TXRF) spectroscopy
StatusRevised, Superseded, Withdrawn
Publication Date15 May 2001
Confirm Date01 February 2007
Withdrawn Date31 July 2014
Normative References(Required to achieve compliance to this standard)No other standards are normatively referenced
Informative References(Provided for Information)No other standards are informatively referenced
Replaced ByBS ISO 14706:2014
International RelationshipsISO 14706:2000
Draft Superseded By99/122512 DC
DescriptorsSurface chemistry, Surface properties, Surfaces, Surfactants, Chemical analysis and testing, Contamination, Contaminants, Silicon, Substrates (insulating), X-ray fluorescence spectrometry, X-ray analysis, Fluorimetry, Reflection, Atoms, Density, Epitaxial layers
ICS71.040.40
Title in FrenchAnalyse chimique des surfaces. Determination de la contamination en elements a la surface des tranches de silicium par spectroscopie de fluorescence X a reflexion totale
Title in GermanChemische Analytik an Oberflaechen. Bestimmung der Oberflaechenkontaminationen auf Silizium-Wafern mit Hilfe der "Total X-Ray Fluorescence Spectroscopy" (TXRF)
CommitteeCII/60
ISBN0 580 37252 9
PublisherBSI
FormatA4
DeliveryNo
Pages32
File Size607.4 KB
Price£182.00


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